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searching for Dry etching 17 found (33 total)

Microthermoforming (1,193 words) [view diff] exact match in snippet view article find links to article

with electroplating (see also the so-called 'LIGA' process) and wet or dry etching. And they can be fabricated of various materials such as metal, silicon

Surface micromachining (589 words) [view diff] exact match in snippet view article find links to article

involving an acid, or a dry etch involving an ionized gas (or plasma). Dry etching can combine chemical etching with physical etching or ion bombardment

Cantilever (2,120 words) [view diff] exact match in snippet view article find links to article

cantilever structure to release it, often with an anisotropic wet or dry etching technique. Without cantilever transducers, atomic force microscopy would

Slot-waveguide (2,101 words) [view diff] exact match in snippet view article find links to article

and strips widths are defined by electron- or photo-lithography and dry etching techniques whereas in horizontal slot-waveguides the slot and strips

Nano and Micro Devices Center (250 words) [view diff] exact match in snippet view article find links to article

Langmuir- Blodgett technique. Material Removal Processes: these include dry etching such as reactive ion etching, or wet etching such as anisotropic etching

Resist (semiconductor fabrication) (607 words) [view diff] exact match in snippet view article

an appropriate solvent. Processing through the resist pattern: wet or dry etching, lift-off, doping... Resist Stripping Electron beam lithography Nanolithography

Microfabrication (2,101 words) [view diff] exact match in snippet view article find links to article

physically attacks the film until it is removed. Etching techniques include: Dry etching (plasma etching) such as reactive-ion etching (RIE) or deep reactive-ion

Etching (microfabrication) (1,675 words) [view diff] exact match in snippet view article

Simplified illustration of dry etching using positive photoresist during a photolithography process in semiconductor microfabrication. Note: Not to scale

Plasma etching (1,831 words) [view diff] exact match in snippet view article find links to article

removed. This is also done in a special plasma etcher, called an asher. Dry etching allows a reproducible, uniform etching of all materials used in silicon

Nanorod (1,865 words) [view diff] exact match in snippet view article find links to article

InGaN/GaN nanorod array light-emitting diodes can be manufactured with dry etching or focused ion beam etching techniques. Such LEDs emit polarized blue

Plasma-activated bonding (1,399 words) [view diff] exact match in snippet view article find links to article

temperature Annealing (room temperature to 400 °C) The RIE mode is used in dry etching processes and through reduction of parameters, i.e. HF power, this method

Sulfur hexafluoride (3,922 words) [view diff] case mismatch in snippet view article find links to article

504–506. ISBN 9780750665261. Y. Tzeng, T.H. Lin (September 1987). "Dry Etching of Silicon Materials in SF 6 Based Plasmas" (PDF). Journal of the Electrochemical

QFET (2,380 words) [view diff] exact match in snippet view article find links to article

etching can be used to create layers of thickness 3 μm or larger, while dry etching techniques can be used to achieve layers on the nanometer scale. When

Bio-MEMS (9,646 words) [view diff] exact match in snippet view article find links to article

to PDMS. Conventional micromachining techniques such as wet etching, dry etching, deep reactive ion etching, sputtering, anodic bonding, and fusion bonding

Self-cleaning surfaces (6,213 words) [view diff] exact match in snippet view article find links to article

production of smaller features. Plasma treatment of surfaces is essentially a dry etching of the surface. This is achieved by filling a chamber with gas, such

Israeli printmaking (6,737 words) [view diff] exact match in snippet view article find links to article

technique of photographic etching, on which he combined drawing and dry etching. The plates were combined in a collage, cut and twisted to give them

List of fellows of IEEE Electron Devices Society (69 words) [view diff] exact match in snippet view article find links to article

1994 Evelyn Hu For contributions to the development of high-resolution dry etching processes in compound semiconductors 1994 James C Hwang For contributions