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searching for Plasma etching 25 found (70 total)

alternate case: plasma etching

Surface treatment of PTFE (1,883 words) [view diff] exact match in snippet view article find links to article

The primary methods currently used in industry are sodium etching and plasma etching. Results of ion beam treatment and laser surface roughening have also
Antenna effect (1,023 words) [view diff] exact match in snippet view article find links to article
each net is disconnected from the initial global metal layer, and the plasma etching is still adding charges to each piece of metal. Leaky gate oxides, although
Boron tribromide (677 words) [view diff] exact match in snippet view article find links to article
manufacturing, image processing, semiconductor doping, semiconductor plasma etching, and photovoltaic manufacturing. List of highly toxic gases NIOSH Pocket
Beam lead technology (355 words) [view diff] case mismatch in snippet view article find links to article
included: Selective Removal of Material Using Cathodic Sputtering (Plasma Etching/RIE), US Patent #3,271,286; issued 1966 PtSi Semiconductor Contacts
Bismuth telluride (1,062 words) [view diff] exact match in snippet view article find links to article
and Raman studies of topological insulator materials subject to argon plasma etching". Philosophical Magazine. 93 (6): 681–689. arXiv:1209.2919. Bibcode:2013PMag
Physical verification (502 words) [view diff] exact match in snippet view article find links to article
accumulation can occur on the antenna during certain fabrication steps like Plasma etching, which uses highly ionized matter to etch. If the connection to silicon
Lam Research (1,765 words) [view diff] exact match in snippet view article find links to article
was while he was at Hewlett Packard that he saw the need for better plasma etching equipment, to keep up with the rapid miniaturization of semiconductor
Degree of ionization (764 words) [view diff] case mismatch in snippet view article find links to article
Brian (25 September 1980). Glow Discharge Processes: Sputtering and Plasma Etching. New York: John Wiley & Sons. ISBN 978-0471078289. Archived from the
Barbara Cooper (physicist) (575 words) [view diff] exact match in snippet view article
relevant in fabrication processes based on surface chemistry, including plasma etching. She built up her lab from scratch, creating ion-beam systems operating
Resistive random-access memory (6,177 words) [view diff] exact match in snippet view article find links to article
"magneto-resistive random access memory" by utilizing electron cyclotron resonance plasma etching. Leon Chua argued that all two-terminal non-volatile memory devices
Quantemol (2,341 words) [view diff] exact match in snippet view article find links to article
and Mark J. Kushner. "Investigations of surface reactions during C2F6 plasma etching of SiO2 with equipment and feature scale models." Journal of Vacuum
Surface tension biomimetics (1,521 words) [view diff] exact match in snippet view article find links to article
biomimetic surface that was created using standard photolithography and plasma etching to create hydrophilic spots on a hydrophobic substrate for water collection
Die singulation (1,289 words) [view diff] exact match in snippet view article find links to article
plasma dicing may be used, which replaces the dicer's saw with DRIE plasma etching. The DBG process requires a back grinding tape that has the following
Polydimethylsiloxane (4,221 words) [view diff] exact match in snippet view article find links to article
particular PDMS block, hydrophilic surface modification is conducted using plasma etching techniques. Plasma treatment disrupts surface silicon-oxygen bonds,
Hisashi Kobayashi (1,412 words) [view diff] exact match in snippet view article find links to article
engineered materials, discrete mathematics for computer science, and plasma etching. After finishing his tenure as Dean, he was an NEC C&C visiting professor
Nanodiamond (2,857 words) [view diff] no match in snippet view article find links to article
treatments for BDD surface modifications including anodization, hydrogen plasma, etching into porous forms, carbon-based nanomaterials, polymer films and nanoparticles
Tris(trimethylsilyl)amine (1,628 words) [view diff] exact match in snippet view article
polydichlorophosphazenes. Nitrogen trifluoride NF3 (which is used, inter alia, for the plasma etching of silicon wafers) is obtainable from tris(trimethylsilyl)amine and
Resonant-tunneling diode (2,889 words) [view diff] exact match in snippet view article find links to article
; Berger, P.R.; Yu, R.; Thompson, P.E. (2006). "Low sidewall damage plasma etching using ICP-RIE with HBr chemistry of Si/SiGe resonant interband tunnel
Nanoarchitectures for lithium-ion batteries (2,752 words) [view diff] exact match in snippet view article find links to article
substrate. One way to create perforations is through inductive coupled plasma etching on silicon. Another approached used highly anisotropic etching of a
Diamond-like carbon (4,155 words) [view diff] case mismatch in snippet view article find links to article
Wang, YI-QI; Lee, Seunghun (2015). "Effect of Physical and Chemical Plasma Etching on Surface Wettability of Carbon Fiber-Reinforced Polymer Composites
Irving P. Herman (2,194 words) [view diff] exact match in snippet view article find links to article
diagnostics of thin film processing, including that of surfaces during plasma etching by using laser thermal desorption of surface adsorbates, then detected
Rodney S. Ruoff (3,900 words) [view diff] exact match in snippet view article find links to article
(1999). "Patterning of highly oriented pyrolytic graphite by oxygen plasma etching". Applied Physics Letters. 75 (2): 193. Bibcode:1999ApPhL..75..193L
T centre (1,838 words) [view diff] exact match in snippet view article find links to article
followed by a thermal annealing process. It has been shown that both plasma etching as well as irradiating the sample with either neutrons or electrons
Robert W. Conn (3,356 words) [view diff] exact match in snippet view article find links to article
Inc. (PMT), which developed a system known as MORI that was used for plasma etching and chemical vapor deposition (CVD), steps that are central to the fabrication
Paper-based microfluidics (7,627 words) [view diff] exact match in snippet view article find links to article
agent such as AKD or fluorocarbon plasma polymerization, and then O2 plasma etching with a mask is used to create hydrophilic patterns in the paper. One